What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

It’s a problem that few of us will likely ever face: once you’ve built your first homemade integrated circuit, what do you do next? If you’re [Sam Zeloof], the answer is clear: build better integrated ...

LONDON — Deep reactive ion etching of silicon is being offered as a service by QinetiQ, the spin-out from Britain's Defence Evaluation Research Agency, and as one part of a micro-electro-mechanical ...

Etching is a way of removing a material through either chemical or physical means. There are many ways etching of the surface a material can be performed, but in the world of nanoscale etching, ...

Researchers from Lam Research, the University of Colorado Boulder, and Princeton Plasma Physics Laboratory (PPPL) investigated ways to speed up the cryogenic reactive ion etching process for 3D NAND ...

The demand for accurate characterization of high aspect ratio geometries such as narrow gaps, deep trenches or deep holes arises in many technologies and industries. A variety of metrology techniques ...

To store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be studied in greater detail. By investigating new approaches to making digital ...

In this paper, we describe how Oxford Instruments Plasma Technology solution delivers controlled processing of slanted gratings used as light coupler for Augmented Reality waveguide combiners. We ...

The electronics industry is the modern ''toolmaker'' for the world economy and as such helps to generate jobs and improve productivity in most other industries. Automobiles, airplanes, telephones, ...

Devices being manufactured using 2xnm and smaller etch applications run an increased risk of building up surface charges that can result in plasma induced device damage (PID). The Primo iDEA ...